发明名称 |
Lithographic system, device manufacturing method, setpoint data optimization method, and apparatus for producing optimized setpoint data |
摘要 |
An iterative method of producing optimized setpoint data for controlling the actuation of elements of an array of individually controllable elements in a maskless system and systems therefore. The optimization is based on estimation of a device structure that can utilizes one or more of the following factors: the low-pass characteristics of the projection system, the configuration of the illumination system, and the process window properties.
|
申请公布号 |
US2008143982(A1) |
申请公布日期 |
2008.06.19 |
申请号 |
US20060638675 |
申请日期 |
2006.12.14 |
申请人 |
ASML HOLDING N.V.;ASML NETHERLANDS B.V. |
发明人 |
TROOST KARS ZEGER;HINTERSTEINER JASON DOUGLAS;TINNEMANS PATRICIUS ALOYSIUS JACOBUS;CEBUHAR WENCESLAO A.;ALBRIGHT RONALD P.;KASTRUP BERNARDO |
分类号 |
G03B27/42;G03B27/32 |
主分类号 |
G03B27/42 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|