发明名称 SEMICONDUCTOR DEVICE HAVING PARTIALLY INSULATED FIELD EFFECT TRANSISTOR (PiFET) AND METHOD OF FABRICATING THE SAME
摘要 Embodiments of the invention include a partially insulated field effect transistor and a method of fabricating the same. According to some embodiments, a semiconductor substrate is formed by sequentially stacking a bottom semiconductor layer, a sacrificial layer, and a top semiconductor layer. The sacrificial layer may be removed to form a buried gap region between the bottom semiconductor layer and the top semiconductor layer. Then, a transistor may be formed on the semiconductor substrate. The sacrificial layer may be a crystalline semiconductor formed by an epitaxial growth technology.
申请公布号 US2008145989(A1) 申请公布日期 2008.06.19
申请号 US20080040636 申请日期 2008.02.29
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 OH CHANG-WOO;PARK DONG-GUN;CHOE JEONG-DONG;KIM MIN-SANG;KIM SUNG-MIN
分类号 H01L21/336;H01L29/06;C30B23/00;H01L21/331;H01L21/762;H01L21/8234;H01L29/10;H01L29/78 主分类号 H01L21/336
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