EXPOSURE DEVICE FOR NON PLANAR SUBSTRATE, PATTERNING METHOD FOR NON PLANAR SUBSTRATE USING THE DEVICE AND PATTERNED NON PLANAR SUBSTRATE USING THE METHOD THEREOF

摘要

An exposure device for non-planar substrate, a non-planar substrate patterning method using the same, and a non-planar substrate patterned by the same method are provided to form a pattern on an entire surface of the non-planar substrate by rotating and exposing the non-planar substrate. A mask preparation process is performed to prepare a mask(100) having a non-planar substrate(300), a glass substrate(200), and a predetermined pattern(50). The mask is attached on a lower part of the glass substrate. A surface of the non-planar substrate is coated with photoresist(400). The non-planar substrate is arranged within a range without diffraction to the mask. The photoresist coated on the non-planar substrate is exposed by using a rotary exposure apparatus. The non-planar substrate is formed with a cylinder.