发明名称 MANUFACTURING METHOD OF SOLID-STATE IMAGING ELEMENT AND SOLID-STATE IMAGING ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide the manufacturing method of solid-state imaging element, excellent in the bonding property of a pad section and surface roughness will not be generated in a micro-lens, and the solid-state imaging element. SOLUTION: The manufacturing method of the solid-state imaging element comprises (1) a process for forming a flattened layer 34, (2) a process for forming a color filter layer 33, (3) a process for forming a lens material layer 35, (4) a process for forming a lens matrix 20 and (5) a process for dry etching through O<SB>2</SB>gas is effected to transfer a lens matrix pattern and make micro-lenses 39 from the lens material layer 35. In this case, the dry etching through O<SB>2</SB>gas is effected under a condition that RF power 140-80 W, bias 140-80 W, pressure 0.2-0.1 Pa, flow of oxygen 12-8 sccm. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008135616(A) 申请公布日期 2008.06.12
申请号 JP20060321420 申请日期 2006.11.29
申请人 TOPPAN PRINTING CO LTD 发明人 TAKEDA TAKUMI;MIYAGAWA SUSUMU
分类号 H01L27/14 主分类号 H01L27/14
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