发明名称 NANOLAMINATE-STRUCTURE DIELECTRIC FILM FORMING METHOD
摘要 Nanolaminate-structure SrO/TiO films are formed on a lower electrode of a capacitor by molecular layer deposition kept in a rate-determined state by a surface reaction. The nanolaminate-structure SrO/TiO films are formed by alternately laminating one or more and 20 or less SrO molecular layers and one or more and 20 or less TiO molecular layers at 150° C. or more and 400° C. or less and at 10 Torr or more and the atmospheric pressure or less. This makes it possible to obtain the nanolaminate-structure SrO/TiO films with a high permittivity and a high coverage and with no occurrence of crystalline foreign substance.
申请公布号 US2008135983(A1) 申请公布日期 2008.06.12
申请号 US20070776300 申请日期 2007.07.11
申请人 NAKANISHI NARUHIKO 发明人 NAKANISHI NARUHIKO
分类号 H01L23/58;H01L21/20;H01L21/31 主分类号 H01L23/58
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