发明名称 DISK PEDESTAL OF ION IMPLANT APPARATUS
摘要 PURPOSE: A disc type pedestal of an ion implantation device is provided to restrain a wafer from being dropped out of a handler due to the residues of photoresist by using support pins. CONSTITUTION: A disc type pedestal of an ion implantation device is provided with a body(12) and a plurality of screw grooves(14) in the body. The disc type pedestal further includes a plurality of support pins(16) inserted into the screw grooves for spacing a wafer away from the body. The support pins are equally spaced apart from each other on the body. Each support pin has a screw portion for exactly gearing into the screw groove.
申请公布号 KR100837548(B1) 申请公布日期 2008.06.12
申请号 KR20020083431 申请日期 2002.12.24
申请人 发明人
分类号 H01L21/265 主分类号 H01L21/265
代理机构 代理人
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