发明名称 LINEAR DEFECT DETECTOR, SEMICONDUCTOR SUBSTRATE MANUFACTURING DEVICE, LINEAR DEFECT DETECTION METHOD, SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD, PROGRAM FOR CAUSING COMPUTER TO FUNCTION AS THE DETECTOR OR THE MANUFACTURING DEVICE, AND STORAGE MEDIUM FOR STORING THE PROGRAM THEREIN
摘要 <P>PROBLEM TO BE SOLVED: To provide an inspection method for accurately inspecting a linear defect. <P>SOLUTION: This inspection method is equipped with steps of: (S920) reading image data; (S930) splitting an image; (S940) projecting light and shade for each of split images to generate one-dimensional data; (S950) determining a linear defect candidate A for each of the split images; (S960) generating defect candidate emphasis one-dimensional data; (S970) calculating an average value by integrating defect candidate emphasis one-dimensional data in domains of linear defect candidates A as to all the split images; and (S980) calculating the domain of a linear defect candidate extending over a plurality of split images from the average value. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008134196(A) 申请公布日期 2008.06.12
申请号 JP20060322082 申请日期 2006.11.29
申请人 SHARP CORP 发明人 YANASE MASAKAZU
分类号 G01N21/88;G01B11/24;G01B11/30;G01M11/00;G02F1/13;G06T1/00 主分类号 G01N21/88
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