| 摘要 |
A functional block for assembly includes at least one element and a magnetic film attached to the element and having a magnetic remanence (M<SUB>R</SUB>/M<SUB>S</SUB>) of less than about 0.2, having a coercive field (H<SUB>c</SUB>) of less than about 100 Oersteds (100 Oe) and having a permeability (mu) of greater than about two (2). At least one element is selected from the group consisting of a semiconductor device, a passive element, a photonic bandgap element, a luminescent material, a sensor, a micro-electrical mechanical system (MEMS), an energy harvesting device and combinations thereof. An article for assembly includes a substrate and a patterned magnetic film disposed on the substrate and defining at least one receptor site. The patterned magnetic film is magnetized primarily in a longitudinal direction and is characterized by a BH product of greater than about 1 megaGauss Oe.
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