| 发明名称 |
CLEANING LIQUID, CLEANING METHOD, LIQUID GENERATING APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<p>In an exposure apparatus, a substrate is exposed to an exposure beam through an exposure liquid. A cleaning liquid is supplied to the exposure apparatus for cleaning at least a part of the exposure apparatus. In the cleaning liquid, a prescribed gas is dissolved at a saturating concentration or more.</p> |
| 申请公布号 |
WO2008069211(A1) |
申请公布日期 |
2008.06.12 |
| 申请号 |
WO2007JP73414 |
申请日期 |
2007.12.04 |
| 申请人 |
NIKON CORPORATION;KURITA WATER INDUSTRIES LTD.;NAGASAKA, HIROYUKI;MORITA, HIROSHI;TOKOSHIMA, HIROTO |
发明人 |
NAGASAKA, HIROYUKI;MORITA, HIROSHI;TOKOSHIMA, HIROTO |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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