发明名称 8-Mirror microlithography projection objective
摘要 A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective includes a first mirror (S 1 ), a second mirror (S 2 ), a third mirror (S 3 ), a fourth mirror (S 4 ), a fifth mirror (S 5 ), a sixth mirror (S 6 ), a seventh mirror (S 7 ), and an eighth mirror (S 8 ). The light path is provided via the eight mirrors, and in the light path exactly one intermediate image of the object field is provided.
申请公布号 US2008137183(A1) 申请公布日期 2008.06.12
申请号 US20080012825 申请日期 2008.02.06
申请人 发明人 MANN HANS-JURGEN;ULRICH WILHELM;SEITZ GUNTHER
分类号 G02B27/18;G02B17/06 主分类号 G02B27/18
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