DEVICE FOR DETOXICATING SEMICONDUCTOR PRODUCTION EXHAUST GAS

摘要

A device for detoxicating semiconductor production exhaust gas capable of long-term, continuous operation while exhibiting excellent space saving performance, by which semiconductor production exhaust gas of high flow rate containing PFCs, and the like, can be detoxicated surely and efficiently. The device is characterized by comprising a plurality of detoxization units (12) that consist of a plasma jet torch (18) and a reaction tube (24) provided on the plasma jet ejection side of the plasma jet torch (18) to surround plasma jet (P) and exhaust gas (F) supplied toward the plasma jet (P) and performing thermal decomposition on the exhaust gas (F) internally and that are connected with semiconductor production equipment (16) through each inlet piping (38) provided with an inlet valve (40) for opening/closing the channel, and each outlet piping (37) provided with an outlet valve (35) for opening/closing the channel and communicating with the exhaust side end of each reaction tube (24).