| 发明名称 |
UV ASSISTED THERMAL PROCESSING |
| 摘要 |
An apparatus (200) and method for thermal processing a substrate (231), which includes a UV radiation source (222) disposed inside a chamber (230) and an infrared source (208) disposed outside the chamber (230) for supplying heat, activate electronic, or create active species inside the chamber (230).
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| 申请公布号 |
WO2007130909(A3) |
申请公布日期 |
2008.06.12 |
| 申请号 |
WO2007US67774 |
申请日期 |
2007.04.30 |
| 申请人 |
APPLIED MATERIALS, INC.;RANISH, JOSEPH MICHAEL;YOKOTA, YOSHITAKA |
发明人 |
RANISH, JOSEPH MICHAEL;YOKOTA, YOSHITAKA |
| 分类号 |
B05D3/06 |
主分类号 |
B05D3/06 |
| 代理机构 |
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代理人 |
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| 主权项 |
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