| 摘要 |
A method of manufacturing a functional film which method enables formation of a fine pattern and endurance for a high-temperature process. The method includes the steps of: (a) preparing a substrate in which a predetermined pattern is formed; (b) forming a separation layer directly or indirectly on the substrate; (c) forming a layer to be peeled containing a functional film, which is formed by using a functional material, on the separation layer; and (d) peeling the layer to be peeled from the substrate or reducing bonding strength between the layer to be peeled and the substrate by heating the separation layer, applying an electromagnetic wave toward the separation layer, or applying an external force to the separation layer.
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