发明名称 |
Substrate comprising a mark |
摘要 |
A substrate comprises a first mark and a second mark. The first mark comprises a first pattern with at least one mark feature formed by a first material and at least one further region formed by a second material. The first and second materials have different material characteristics with respect to a chemical-mechanical polishing process such that a step height in a direction substantially perpendicular to the surface of the substrate may be created by applying the chemical-mechanical polishing process. The second mark can be provided with a second step height by applying the chemical-mechanical polishing process. The second step height is substantially different from the first step height.
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申请公布号 |
US2008138623(A1) |
申请公布日期 |
2008.06.12 |
申请号 |
US20060637215 |
申请日期 |
2006.12.12 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
FRANCISCUS VAN HAREN RICHARD JOHANNES;RIJPERS BARTOLOMEUS PETRUS;SINGH HARMINDER;FINKEN GERALD ARTHUR |
分类号 |
B32B9/04;G03B27/00 |
主分类号 |
B32B9/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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