METHOD FOR PROCESSING MASK DATA, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND PROGRAM FOR EXECUTING MASK DATA PROCESSING

摘要

PROBLEM TO BE SOLVED: To provide a method for processing mask data by which a calculation amount in mask data processing of a semiconductor integrated circuit can be decreased to shorten the turn-around time.

SOLUTION: As for design data having a hierarchical structure including a plurality of cells each having a design pattern, the method includes the following steps. Calculation of mask data processing is carried out (S182) on the design data having an original hierarchical structure. If the total of feature numbers or edge lengths of design patterns on which the calculation is carried out, or the amount of calculation carried out or the expansion degree is predicted to be equal to or higher than a threshold (S183), the hierarchical structure is corrected (S185) so as to decrease the total of feature numbers or edge lengths of design patterns on which the calculation is carried out or the amount of calculation carried out or the expansion degree.

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