| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a liquid treatment apparatus for supplying a treatment liquid from a supply nozzle to the surface of a substrate, in which a cup body to be mounted on the liquid treatment apparatus can be easily mounted and dismounted. <P>SOLUTION: The liquid treatment apparatus 1 is applied to the liquid treatment apparatus applied to a coating unit for coating a treatment liquid such as a resist liquid to a wafer W. In the apparatus, a cup body holding part 3 holds a cylindrical cup body 2 for preventing the treatment liquid from splashing, and a motor cylinder mechanism 4 moves the cup body holding part 3 up and down between a first position at which the cup body 2 is held at the mounting position and a second position, substantially above the first position, at which the cup body 2 is held at a position capable of carrying in and out without causing interference to another apparatus. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
