| 摘要 |
PROBLEM TO BE SOLVED: To provide a means to determine an exposure dose to correct changes in a line width dimension (critical dimension) after drawing a mask. SOLUTION: The method of charged particle beam drawing in one embodiment of the present invention includes: a step S102 of inputting pattern data; a step S104 of predicting the total drawing time for drawing the pattern data; a step S108 of acquiring a reference exposure dose after an optional time by using the relation among time periods after the start time of drawing, the total drawing time and reference exposure doses; the step S108 of acquiring a fog effect correction coefficient after an optional time by using the relation among time periods after the start time of drawing, the total drawing time and fogging effect correction coefficients; a step S110 of calculating an exposure dose after the optional time; and a step S114 of drawing in accordance with the exposure dose. COPYRIGHT: (C)2008,JPO&INPIT
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