发明名称 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
摘要 <p>Based on the positions of a first marker and a second marker of a first substrate placed on a placing surface of a substrate placing table (1), a substrate processing apparatus makes the direction of a line connecting the first marker and the second marker accord with the moving direction of a gantry (2). The positions of the first marker and a third marker, in the status where the direction of the line connecting the first marker and the second marker accord with the moving direction, are stored in a storage section. After a second substrate is placed on the placing surface of the substrate placing table (1), the direction of a line connecting the first marker and the third marker on the second substrate is permitted to accord with the direction which is of the line connecting the first marker on the first substrate and the third marker on the second substrate and is calculated based on the information stored in the storage section.</p>
申请公布号 WO2008069203(A1) 申请公布日期 2008.06.12
申请号 WO2007JP73399 申请日期 2007.12.04
申请人 SHARP KABUSHIKI KAISHA;MORII, KOJIRO 发明人 MORII, KOJIRO
分类号 H01L21/68;G02F1/13;G09F9/00 主分类号 H01L21/68
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