CHARGED PARTICLE BEAM DEVICE, SCANNING ELECTRON MICROSCOPE, AND TESTPIECE OBSERVATION METHOD

摘要

PROBLEM TO BE SOLVED: To obtain a charged particle beam device which conducts an inspection at high speed with high sensitivity by acquiring an observation image of high resolution and high contrast through efficiently detecting a secondary signal without increasing aberration of a primary electron beam, and by detecting defects from the observation image. SOLUTION: After scanning a desired region of a testpiece by a primary charged particle beam and colliding secondary charged particles secondarily generated from the region by irradiation of the primary charged particle beam with secondary electron conversion electrodes 33, secondary electrons generated by a first E×B deflector 31 fixed to the surface on the sample side of the secondary electron conversion electrodes 33 via an insulating material is taken in a detector 34. At the same time, deflective chromatic aberrations are suppressed which are generated in the primary charged particle beam at the first E×B deflector 31 by a second E×B deflector 32 fixed to the first E×B deflector 31, and the observation image of high resolution and high contrast without shading is acquired. COPYRIGHT: (C)2008,JPO&INPIT