| 摘要 |
PROBLEM TO BE SOLVED: To provide a rear surface cleaning apparatus capable of well cleaning the rear surface of a substrate without turning the substrate up side down, and to provide a substrate processing apparatus equipped with the rear surface cleaning apparatus and a rear surface cleaning method. SOLUTION: The substrate W carried into a processing chamber 1 is held in a spin chuck 2 in a state where its substrate front surface Wf faces upward. Subsequently, DIW is supplied to the rear surface Wb of the substrate W to be rotatably driven, thereby forming a liquid film on the substrate rear surface Wb. Then, a cooling gas discharge nozzle 3 is swung toward the end edge position of the substrate W from the rotation center position of the substrate W while the cooling gas discharge nozzle 3 is locally discharging a cooling gas toward the substrate front surface Wf. In this way, a frozen film is formed on the entire surface of the substrate rear surface Wb. Then, film removing processing is executed for the substrate rear surface Wb to remove the frozen film from the substrate rear surface Wb. COPYRIGHT: (C)2008,JPO&INPIT |
