发明名称 Semiconductor device comprising a doped metal comprising main electrode
摘要 A semiconductor device is provided comprising a main electrode ( 4 ) and a dielectric ( 3 ) in contact with the main electrode ( 4 ), the main electrode ( 4 ) comprising a material having a work function and a work function modulating element ( 6 ) for modulating the work function of the material of the main electrode ( 4 ) towards a predetermined value. The main electrode ( 4 ) furthermore comprises a diffusion preventing dopant element ( 5 ) for preventing diffusion of the work function modulating element ( 6 ) towards and/or into the dielectric ( 3 ). Methods for forming such a semiconductor device are also described.
申请公布号 US2008136030(A1) 申请公布日期 2008.06.12
申请号 US20070977027 申请日期 2007.10.23
申请人 INTERUNIVERSITAIR MICROELEKTRONICACENTRUM (IMEC);TEXAS INSTRUMENTS INC.;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. 发明人 CHANG SHOU-ZEN;KITTL JORGE ADRIAN;YU HONGYU;LAUWERS ANNE;VELOSO ANABELA
分类号 H01L23/48;H01L21/425 主分类号 H01L23/48
代理机构 代理人
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