发明名称 |
Semiconductor device comprising a doped metal comprising main electrode |
摘要 |
A semiconductor device is provided comprising a main electrode ( 4 ) and a dielectric ( 3 ) in contact with the main electrode ( 4 ), the main electrode ( 4 ) comprising a material having a work function and a work function modulating element ( 6 ) for modulating the work function of the material of the main electrode ( 4 ) towards a predetermined value. The main electrode ( 4 ) furthermore comprises a diffusion preventing dopant element ( 5 ) for preventing diffusion of the work function modulating element ( 6 ) towards and/or into the dielectric ( 3 ). Methods for forming such a semiconductor device are also described.
|
申请公布号 |
US2008136030(A1) |
申请公布日期 |
2008.06.12 |
申请号 |
US20070977027 |
申请日期 |
2007.10.23 |
申请人 |
INTERUNIVERSITAIR MICROELEKTRONICACENTRUM (IMEC);TEXAS INSTRUMENTS INC.;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
发明人 |
CHANG SHOU-ZEN;KITTL JORGE ADRIAN;YU HONGYU;LAUWERS ANNE;VELOSO ANABELA |
分类号 |
H01L23/48;H01L21/425 |
主分类号 |
H01L23/48 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|