发明名称 Scatterometer, a lithographic apparatus and a focus analysis method
摘要 To detect whether a substrate is in a focal plane of a scatterometer, a cross-sectional area of radiation above a certain intensity value is detected both in front of and behind a back focal plane of the optical system of the scatterometer. The detection positions in front of and behind the back focal plane should desirably be equidistant from the back focal plane along the path of the radiation redirected from the substrate so that a simple comparison may determine whether the substrate is in the focal plane of the scatterometer.
申请公布号 US2008135774(A1) 申请公布日期 2008.06.12
申请号 US20060635787 申请日期 2006.12.08
申请人 ASML NETHERLANDS B.V. 发明人 HUGERS RONALD FRANCISCUS HERMAN
分类号 G01T1/00 主分类号 G01T1/00
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