发明名称 |
POSITIVE RESIST COMPOSITION AND METHOD FOR FORMATION OF RESIST PATTERN |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition and a method for formation of a resist pattern using the positive resist composition. <P>SOLUTION: The positive resist composition comprises a resin component (A) whose alkali solubility can be increased by the action of an acid and an acid generator component (B) which can generate an acid upon being exposed to light, wherein the resin component (A) comprises a polymer (A2) having a constituent unit (a1) represented by general formula (II). <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2008134607(A) |
申请公布日期 |
2008.06.12 |
申请号 |
JP20070235764 |
申请日期 |
2007.09.11 |
申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
UCHIUMI YOSHIYUKI;SHIMIZU HIROAKI;YOSHII YASUHIRO |
分类号 |
G03F7/039;C08F20/22;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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