发明名称 TUNNEL MAGNETORESISTIVE EFFECT ELEMENT AND MANUFACTURING METHOD THEREOF
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a TMR element capable of obtaining a high MR ratio without performing high-temperature annealing treatment when using a tunnel barrier layer made of a crystalline insulating material, and to provide a thin-film magnetic head, a magnetic memory, and a method of manufacturing the TMR element. <P>SOLUTION: There are provided: a lower magnetic layer; an upper magnetic layer; and a tunnel barrier layer made of the crystalline insulating material sandwiched by the lower and upper magnetic layers. The lower magnetic layer contains a first magnetic layer, and a second magnetic layer sandwiched between the first magnetic layer and the tunnel barrier layer. The second magnetic layer is composed of a magnetic material including at least one of Fe, cobalt Co, and nickel Ni. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008135432(A) 申请公布日期 2008.06.12
申请号 JP20060318275 申请日期 2006.11.27
申请人 TDK CORP 发明人 MIURA SATOSHI;UESUGI TAKUMI
分类号 H01L43/08;G01R33/09;G11B5/39;H01F10/16;H01F10/30;H01L21/8246;H01L27/105 主分类号 H01L43/08
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