发明名称 |
LOW-K DAMAGE AVOIDANCE DURING BEVEL ETCH PROCESSING |
摘要 |
A method for etching a bevel edge of a substrate is provided. A patterned photoresist mask is formed over the etch layer. The bevel edge is cleaned comprising providing a cleaning gas comprising at least one of a CO<SUB>2</SUB>, CO, C<SUB>x</SUB>H<SUB>y</SUB>, H<SUB>2</SUB>, NH<SUB>3</SUB>, C<SUB>x</SUB>H<SUB>y</SUB>F<SUB>z</SUB> and a combination thereof, forming a cleaning plasma from the cleaning gas, and exposing the bevel edge to the cleaning plasma. Features are etched into the etch layer through the photoresist features and the photoresist mask is removed.
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申请公布号 |
WO2008024792(B1) |
申请公布日期 |
2008.06.12 |
申请号 |
WO2007US76444 |
申请日期 |
2007.08.21 |
申请人 |
LAM RESEARCH CORPORATION;KIM, YUNSANG;BAILEY III, ANDREW;CHEN, JACK |
发明人 |
KIM, YUNSANG;BAILEY III, ANDREW;CHEN, JACK |
分类号 |
H01L21/02;G03F7/42;H01L21/00;H01L21/311 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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