| 摘要 |
<p>An apparatus and a method for inspecting a photomask, a method for manufacturing a photomask for liquid crystal device fabrication, and a pattern transfer method are provided to perform performance evaluation and defect inspection of a large photomask used for making a liquid crystal display device. An apparatus for inspecting a photomask(3) comprises a mask holder unit(3a), a light source(1), a lighting optical system(2), an objective lens system(4) and an imaging unit(5). The mask holder unit holds the photomask to be inspected. The light source emits light flux of predetermined wavelength. The lighting optical system guides the light flux from the light source, and irradiates the light flux to the photomask supported by the mask holder unit. The objective lens system receives the light flux irradiated to the photomask and passed through the photomask. The imaging unit receives the light flux passed through the objective lens system and photographs the photomask.</p> |
