METHOD FOR MANUFACTURING FLOATING STRUCTURE OF MICROELECTROMECHANICAL SYSTME

摘要

A method for manufacturing a floating structure of a micro-electrochemical integrated system is provided to selectively etch a thick oxidation film by forming a micro-channel at high etching speed by isotropically etching a sacrificial layer. A method for manufacturing a floating structure of a micro-electrochemical integrated system includes the steps of: forming a sacrificial layer including a thin-film pattern(102A) with impurities doped on a substrate(100); forming a support film on the sacrificial layer; forming a structure to be floated on the support film through post processes; forming an etching hole(115) for exposing both sides of the thin-film pattern; and forming an air gap between the support film and the substrate by removing the sacrificial layer via the etching hole.