| 摘要 |
<p>A thermostable negative photosensitive resin composition excelling in sensitivity and resolution; a method of pattern forming in which use is made of the resin composition, permitting development with an alkali aqueous solution, and in which there can be obtained a pattern of good morphology excelling in sensitivity, resolution and heat resistance; and highly reliable electronic parts. Semiconductor substrate (1) provided with first conductor layer (3), second conductor layer (7) and interlayer insulating film (4) is spin coated with a negative photosensitive resin composition, dried and exposed to light emitted above a mask with a pattern for forming of window (6C) in given region. The resin composition is developed with the use of an alkali aqueous solution, heated (hardened), and provided with surface protective film (8). The above negative photosensitive resin composition contains (a) polymer soluble in an alkali aqueous solution, having a phenolic hydroxyl at a molecular terminal thereof, (b) compound generating an acid upon actinic light irradiation and (c) compound capable of crosslinking or polymerization by the action of an acid.</p> |
