发明名称 Mask and deposition apparatus using the same
摘要 A mask (310) and a deposition apparatus using the same are disclosed. One embodiment of the mask (310) is used for depositing a thin film on the substrate having a plurality of sub-pixel regions. The mask includes a first region (31) having a plurality of the first openings (311R,311G,311B), each of which corresponds to one of the plurality of sub-pixel regions. The mask also includes second regions (32) having a plurality of the second openings (312R,312G,312B), each of which corresponds to at least two of the plurality of the sub-pixel regions. The second regions (32) are positioned on both sides of the first region (31).
申请公布号 EP1916726(A3) 申请公布日期 2008.06.11
申请号 EP20070119429 申请日期 2007.10.26
申请人 SAMSUNG SDI CO., LTD. 发明人 KIM, TAE-SEUNG
分类号 H01L51/56 主分类号 H01L51/56
代理机构 代理人
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