| 摘要 |
<p>An exposure apparatus and a method for manufacturing a device are provided to automatically determines a measurement condition suitable for a calculation of a shot arrangement by using a controller for calculating a variation of a calculated shot arrangement. A measurement apparatus(2) measures a position of an alignment mark in each shot region on a substrate(W). A controller(10) generates plural sample shot sets from the shot regions on the substrate and directs the measurement apparatus to measure a position of an alignment mark under plural measurement conditions with respect to the respective sample shot sets. The controller calculates a shot arrangement with respect to each of combinations of the plural measurement conditions and the plural sample shot sets based on the measured position. The controller also calculates a variation of the calculated shot arrangement with respect to the respective measurement conditions, thereby displaying the calculated variation.</p> |
