Embodiments of the invention provide a device with a multiple gates. Stress material within recesses of a device body metal gate may cause a stress in channel regions of the device, thereby improving performance of the device.
申请公布号
GB2444681(A)
申请公布日期
2008.06.11
申请号
GB20080006339
申请日期
2006.12.07
申请人
INTEL CORPORATION
发明人
ROBERTS CHAU;JACK KAVALIEROS;JUSTIN BRASK;SUMAN DATTA;BRIAN S DOYLE