| 摘要 |
A position measuring method and system, and an exposure device are provided to reduce a wavelength compensation error of laser light due to a phase difference of aerial vibration between the optical path of a laser interferometer and the detecting position of a wavelength detector. A position measuring system comprises a measurement unit(6), a wavelength detector(2), a first compensation unit(5) and a second compensation unit. The measurement unit includes laser interferometers(23,24) configured to measure the position of a measurement target by using interference of laser light. The wavelength detector is configured to detect changes in wavelength of the laser light. The first compensation unit is configured to compensate for the wavelength change detected by the wavelength detector on the basis of a phase difference of aerial vibration between the wavelength detector and the optical path of the laser interferometer, which is determined on the basis of a difference in length between a first path of the aerial vibration from an aerial vibration source of an air conditioner to the wavelength detector and a second path of the aerial vibration from the aerial vibration source to the optical path of the laser interferometer. The second compensation unit is configured to compensate for a measurement value obtained by the laser interferometer on the basis of the wavelength change compensated by the first compensation unit, wherein the first path is shorter than the second path.
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