发明名称 |
Substrate processing method, substrate processing apparatus and substrate processing system |
摘要 |
After subjected to a developing process, a rinsing process and a replacing process in this order in a developing unit 10 A, 10 B, a substrate W wet with an anti-drying solution is wet-transported to a supercritical drying unit 20 by a primary transport robot 30 . The supercritical drying unit 20 performs a high-pressure drying process (supercritical drying process) in a dedicated manner. Accordingly, by virtue of the presence of the anti-drying solution, the substrate W is effectively prevented from becoming air-dry during the transportation of the substrate W.
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申请公布号 |
US7384484(B2) |
申请公布日期 |
2008.06.10 |
申请号 |
US20030700020 |
申请日期 |
2003.11.03 |
申请人 |
DAINIPPON SCREEN MFG. CO., LTD.;KABUSHIKI KAISHA KOBE SEIKO SHO |
发明人 |
MURAOKA YUSUKE;SAITO KIMITSUGU;IWATA TOMOMI;FUKATSU EIJI;MIZOBATA IKUO;UENO HIROYUKI;OKUYAMA YASUO;GAMA TAKASHI;SAKASHITA YOSHIHIKO;WATANABE KATSUMI;MUNEMASA JUN;OSHIBA HISANORI;SARUMARU SHOGO |
分类号 |
B05C13/02;B05B1/26;B05B7/00;B08B3/00;C23C14/00;G11B7/26;H01L21/00;H01L21/677 |
主分类号 |
B05C13/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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