发明名称 METHOD OF MANUFACTURING COLOR FILTER SUBSTRATE
摘要 A method for manufacturing a color filter substrate is provided to adjust the height of a light shielding pattern by adjusting the amount of ink to be jetted. A color layer forming process is performed to form a color layer including color filters(RCF,GCF,BCF). The color filters are formed in each pixel region of a base substrate(110). A shielding pattern forming process is performed to form a shielding pattern by jetting ink into boundary spaces between adjacent color filters of the color layer by using a print unit. The ink is made of an organic material. The color layer forming process includes a process for forming a color photoresist layer on a base substrate and a process for patterning the color photoresist layer by using the residual color filters of each pixel region.
申请公布号 KR20080050708(A) 申请公布日期 2008.06.10
申请号 KR20060121283 申请日期 2006.12.04
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KWAK, CHANG HUN;KIM, BYOUNG JOO;KIM, JANG SUB;KANG, YOON HO;KWON, SEONG GYU;SHIM, YI SEOP;LEE, KWANG HO;YU, JAE JUN
分类号 G02B5/20;G02F1/1335 主分类号 G02B5/20
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