| 发明名称 |
Method and apparatus for inspecting substrate pattern |
| 摘要 |
A method of inspecting an inspection pattern using a statistical inference function is disclosed. The inference function is generated in relation to optical reference signal data and reference pattern characteristic data for a plurality of reference patterns formed by a unit process of interest on reference substrates.
|
| 申请公布号 |
US7385689(B2) |
申请公布日期 |
2008.06.10 |
| 申请号 |
US20050207772 |
申请日期 |
2005.08.22 |
| 申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM KYE-WEON;JUN CHUNG-SAM;CHUNG KI-SUK;CHON SANG-MUN;KIM SEONG-JIN;LEE BYUNG-SUG;YANG YU-SIN |
| 分类号 |
G01N21/00 |
主分类号 |
G01N21/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
