METHOD FOR MANUFACTURING PHOTORESIST PATTERN AND DISPLAY SUBSTRATE

摘要

A method for manufacturing a photoresist pattern and a display substrate are provided to reduce a residual image of a liquid crystal display panel by removing a residual image cause material included in a color filter. A photoresist layer(20) is coated on a base substrate(10). A partial region of the photoresist layer is exposed by using an exposure mask. The exposed photoresist layer is developed to form a photoresist pattern. A post baking process is performed on the photoresist pattern. A first cleaning process is performed on the post baked photoresist pattern with a basic solution to swell the photoresist pattern. A second cleaning process is performed on the swelled photoresist pattern to remove a foreign substance included in the photoresist pattern and to neutralize an alkaline ion. The basic solution is one of an N-Methylprrolidone solution and a gamma-caprolactone solution. A pre baking process is performed on the coated photoresist layer.