| 摘要 |
Thin film pattern making apparatus and method are provided to save the cost by extending the life time of a blanket and to improve reliability for forming thin film patterns by forming the thin film pattern by a reverse printing method using etch resist solution. A thin film pattern making apparatus is composed of: a roll type print roller(10) wound with a blanket(15) containing polydimethylsiloxane; a sprayer(12) positioned around the print roller to spray etch resist solution(14a) on the blanket; and an intaglio print plate having a groove formed in the shape of a desirable thin film and a protruded part. The etch resist solution contains a solvent satisfying at least one of the following conditions, 6>delta or delta>11 and mu>2(D). delta is a solubility parameter. mu is dipole moment. |
