发明名称 |
Lithographic apparatus and device manufacturing method that limits a portion of a patterning device used to pattern a beam |
摘要 |
A system and method are used to limit a proportion of a programmable patterning means used to pattern a substrate. This is done such that a size of a repeated pattern to be exposed on the substrate is an integer multiple of a size of a pattern exposed on the substrate by the patterned beam.
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申请公布号 |
US7385677(B2) |
申请公布日期 |
2008.06.10 |
申请号 |
US20060354027 |
申请日期 |
2006.02.15 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BLEEKER ARNO JAN |
分类号 |
G03B27/54;G03B27/32;G03B27/42;G03F1/00;G03F7/20;H01L21/027 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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