发明名称 Method for producing a single crystal and a single crystal
摘要 The present invention is a method for producing a single crystal with pulling the single crystal from a raw material melt in a chamber by CZ method, wherein when growing the single crystal, where a pulling rate is defined as V and a temperature gradient of the crystal is defined as G during growing the single crystal, the temperature gradient G of the crystal is controlled by changing at least two or more of pulling conditions. Thereby, there is provided a method for producing a single crystal in which when the single crystal is grown by CZ method, V/G can be controlled without lowering a pulling rate V, and thus the single crystal including a desired defect region can be produced effectively for a short time.
申请公布号 US7384477(B2) 申请公布日期 2008.06.10
申请号 US20040560581 申请日期 2004.05.28
申请人 SHIN-ETSU HANDOTAI CO., LTD. 发明人 SAKURADA MASAHIRO;IIDA MAKOTO;MITAMURA NOBUAKI;OZAKI ATSUSHI
分类号 C30B15/20;C30B29/06;C30B15/00 主分类号 C30B15/20
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