发明名称 |
LASER RESIST TRANSFER FOR MICROFABRICATION |
摘要 |
A method for forming a resist pattern on a substrate (18) places a donor element (12) having a layer of thermoresist material proximate the substrate. A gap is maintained such that the surface of the layer of thermoresist material is spaced apart from the surface of the substrate by a number of spacing elements. Thermal energy is directed toward the donor element (12) according to the resist pattern, whereby a portion of thermoresist material is transferred from the donor element (12) across the gap by ablative transfer and is deposited onto the substrate (18) forming the resist pattern.
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申请公布号 |
KR20080050593(A) |
申请公布日期 |
2008.06.09 |
申请号 |
KR20087007668 |
申请日期 |
2008.03.28 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
TREDWELL TIMOTHY JOHN;TUTT LEE W.;KAY DAVID BLAIR;HONG, YONG TAEK;PEARCE GLENN THOMAS;PHILLIPS SCOTT E. |
分类号 |
G03F7/26;G03F7/34;G03F7/38;H05K3/06 |
主分类号 |
G03F7/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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