| 发明名称 |
UNDERCOAT FORMING MATERIAL |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an undercoat forming material capable of forming an undercoat excellent in etching resistance. <P>SOLUTION: The undercoat forming material for forming an undercoat between a substrate and a resist film contains a fullerene derivative (A1-1) having a partial structure represented by general formula (A1-1) (wherein R<SP>1</SP>-R<SP>5</SP>are each independently a hydroxyphenyl group optionally having a substituent; and R<SP>6</SP>is a hydrogen atom or a 1-5C alkyl group) on the fullerene skeleton of fullerene C<SB>60</SB>. <P>COPYRIGHT: (C)2008,JPO&INPIT |
| 申请公布号 |
JP2008129423(A) |
申请公布日期 |
2008.06.05 |
| 申请号 |
JP20060315776 |
申请日期 |
2006.11.22 |
| 申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
TANAKA TAKESHI;FUJII YASUSHI |
| 分类号 |
G03F7/11;C09D5/00;C09D7/12;C09D201/00;H01L21/027 |
主分类号 |
G03F7/11 |
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