| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition improved in exposure latitude, pattern collapse and performance difference between a dense pattern and an isolated pattern, even in the formation of a fine pattern of 100 nm or smaller, and to provide a pattern forming method that uses the composition. <P>SOLUTION: The positive photosensitive composition comprises (A) a resin which is decomposed by the action of an acid to increase solubility in an alkali developer; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a non-polymer compound which is decomposed by the action of an acid to increase solubility in an alkali developer, wherein a group released by the decomposition due to the action of the acid has a hydroxyl group or an ether bond. The pattern-forming method that uses the composition is also provided. <P>COPYRIGHT: (C)2008,JPO&INPIT |
