| 摘要 |
PROBLEM TO BE SOLVED: To provide a treatment condition determination method, by which treatment conditions for forming a thin film of a desired thickness is determined. SOLUTION: When determining the treatment conditions exhibiting a relation between the processing time of a thin film formation treatment and the thickness of the thin film formed by the thin film formation treatment, the treatment conditions are determined by measuring the thickness Ta (thickness z13) of the thin film formed by conducting the thin film formation treatment, wherein the processing time is defined as L sec (e.g. time point t0-t11) for Na times (e.g. 3 times), measuring the thickness Tb (thickness z23) of the thin film formed by conducting the thin film formation treatment, wherein the processing time is defined as M sec (e.g. time point t0-t21) for Nb times (e.g. 3 times), defining the thickness as Ta/Na (thickness z11) of the thin film formed by the thin film formation treatment, wherein the processing time is defined as L sec, and defining the thickness as Tb/Nb (thickness z21) of the thin film formed by the thin film formation treatment, wherein the processing time is defined as M sec. COPYRIGHT: (C)2008,JPO&INPIT
|
