发明名称 EXCIMER IRRADIATION SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide an excimer irradiation system detecting excimer lamps coming to its end among excimer lamps arranged in the excimer irradiation system to make up for a short light output, thereby substantially dispensing with the rest of a substrate processing apparatus. SOLUTION: The excimer irradiation system has a conveying mechanism for conveying a substrate, and is mounted on the substrate processing apparatus irradiating a substrate with excimer light to process it. The excimer irradiation system arranges a plurality of nearly bar like excimer lamps in parallel to form nearly right angles in a conveying direction of the substrate, has a supply power source capable of independently adjusting the output of the respective excimer lamp, is equipped with a detection function for detecting the light output from the respective excimer lamp, and has a light output replacement function for replacing the light output corresponding to the short light output when the light output from at least one of the excimer lamp does not reach a prescribed light output. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008126150(A) 申请公布日期 2008.06.05
申请号 JP20060314495 申请日期 2006.11.21
申请人 USHIO INC 发明人 HISHINUMA NOBUYOSHI;NAKAMURA MASAKI
分类号 B08B7/00;G21K5/00;H01J65/00;H01L21/304 主分类号 B08B7/00
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