发明名称 |
PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY HAVING A RADIATION DETECTOR FOR SPATIALLY RESOLVED REGISTRATION OF ELECTROMAGNETIC RADIATION |
摘要 |
A microlithography projection exposure tool with a radiation detector for the locally resolved recording of electromagnetic radiation. The radiation detector comprises: a solid state body which is configured to multiply electric charge and a collector which is configured to determine the location of the multiplied electric charge by means of charge division.
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申请公布号 |
US2008128643(A1) |
申请公布日期 |
2008.06.05 |
申请号 |
US20070855328 |
申请日期 |
2007.09.14 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
MUELLER ULRICH;STUEHLER JOACHIM |
分类号 |
G01N21/86 |
主分类号 |
G01N21/86 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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