发明名称 PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY HAVING A RADIATION DETECTOR FOR SPATIALLY RESOLVED REGISTRATION OF ELECTROMAGNETIC RADIATION
摘要 A microlithography projection exposure tool with a radiation detector for the locally resolved recording of electromagnetic radiation. The radiation detector comprises: a solid state body which is configured to multiply electric charge and a collector which is configured to determine the location of the multiplied electric charge by means of charge division.
申请公布号 US2008128643(A1) 申请公布日期 2008.06.05
申请号 US20070855328 申请日期 2007.09.14
申请人 CARL ZEISS SMT AG 发明人 MUELLER ULRICH;STUEHLER JOACHIM
分类号 G01N21/86 主分类号 G01N21/86
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