PHOTOSENSITIVE SILOXANE COMPOSITION, HARDENED FILM FORMED THEREFROM AND DEVICE HAVING THE HARDENED FILM

摘要

It is intended to provide a photosensitive siloxane composition comprising (a) polysiloxane, (b) a quinone diazide compound, (c) a solvent and (d) one or more kinds of imidosilane compounds represented by the general formulae (1) to (3). This photosensitive siloxane composition makes it possible to provide a hardened film which suffers from little shrinkage during hardening, shows a high transparency after thermal hardening, suffers from suppressed cracking after dipping in an alkali solvent and shows an excellent adhesiveness to a baseboard. wherein R¹'s may be either the same or different and each represents a C_1-6 alkyl, C_1-6 alkoxyl, phenyl or phenoxy group or an organic group substituted thereby; R² and R⁴ represent each a divalent C_1-10 organic group; R³ represents a silicon-free C_2-20 organic group (provided that R³ represents an organic group other than a phenyl group in the general formula (1), while R³ represents an unsaturated bond-free organic group other than an alicyclic group in the general formula (2)); and R_a represents a hydrogen atom ora silicon-free C_1-20 organic group.