| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a polishing composition which is capable of selectively polishing a silicon oxide film of a polysilicon film, and to provide a polishing method employing such a polishing composition. <P>SOLUTION: The polishing composition of the present invention comprises: abrasive grains selected from a silica and a ceria; an alkali selected from an ammonia, an ammonium salt, an alkali metal salt and an alkali metal hydroxide; and an organic modified silicone oil selected from a polyoxyethylene-modified silicone oil, a poly(oxyethyleneoxypropylene)-modified silicone oil, an epoxy/polyether-modified silicone oil and an amino/polyether-modified silicone oil. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
