发明名称 MAPPING TYPE ELECTRON MICROSCOPE REDUCING GEOMETRICAL ABERRATIONS AND SPACE-CHARGE EFFECTS
摘要 PROBLEM TO BE SOLVED: To provide a mapping type electron microscope in where a projection imaging optical system is provided with a zooming transfer lens system for improving the geometrical aberrations in low-magnification imaging and space-charge effect in the zooming range. SOLUTION: The mapping type electron microscope includes an illuminating system which irradiates a primary electron beam onto a sample, and the projection imaging optical system 24 which guides a secondary beam irradiated from the sample to a detection system, and the projection imaging optical system 24 is provided with the transfer lens system 24b, having a first zooming lens 6a and a second zooming lens 6b. The first zooming lens 6a has a plurality of electrodes, of which a prescribed electrode is made thick and is supplied with a positive voltage to form a space 10, having zero electric field intensity and high positive potential between the first zooming lens 6a and the second zooming lens 6b; and in the zooming range, a crossover C2 by the first zooming lens 6a is formed in the space 10. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008130501(A) 申请公布日期 2008.06.05
申请号 JP20060317140 申请日期 2006.11.24
申请人 EBARA CORP 发明人 NIN TAKEAKI;MURAKAMI TAKESHI
分类号 H01J37/29 主分类号 H01J37/29
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