| 摘要 |
<P>PROBLEM TO BE SOLVED: To monitor a polarization state of illumination light in a manufacturing process to accurately feedback to an exposure process in exposure using polarized light illumination. <P>SOLUTION: The exposure mask includes a substrate 10 having a mask pattern 11 as an exposure object, a monitoring pattern 12 disposed on the substrate 10, and a polarized light controlling element 20 disposed in the optical path of the monitoring pattern 12 on the substrate 10 and partially changing the polarization direction of polarized light illumination by 90 degrees irradiating the monitoring pattern 12. An aligner using polarized light illumination is disclosed, in which a polarized light controlling element that partially changes the polarization direction of illumination light by 90 degrees is disposed as freely advancing and retreating in the exposure optical path by the polarized light illumination. <P>COPYRIGHT: (C)2008,JPO&INPIT |
