| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for producing a resin by removing a low molecular eight component giving bad effects to its resist performance effectively and simply, the resin and further a positive type photosensitive composition improved with resist performance [light exposure latitude, LER (line edge roughness), development defects and preservation stability], and a method for forming a pattern by using the same. <P>SOLUTION: This method for producing the resin increasing dissolving rate to an alkaline developing liquid by an action of an acid is provided by comprising a process of adding a solvent (b) containing a poor solvent to a solution (a) containing the resin of which dissolving rate to the alkaline development liquid is increased by the action of the acid to prepare a solution (c), and a process of precipitating the resin of which dissolving rate to the alkaline development liquid is increased by the action of the acid by adding the solution (c) to a solvent (d) containing the poor solvent. The resin produced by such the method of production, the positive type photosensitive composition containing the above resin and the method for forming the pattern by using the same are also provided. <P>COPYRIGHT: (C)2008,JPO&INPIT |
